Registration Dossier
Registration Dossier
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EC number: 231-130-8 | CAS number: 7440-21-3
Additional physico-chemical information
Administrative data
- Endpoint:
- other: surface composition
- Type of information:
- experimental study
- Adequacy of study:
- key study
- Reliability:
- 2 (reliable with restrictions)
- Rationale for reliability incl. deficiencies:
- other: Acceptable, well-documented study report which meets basic scientific principles
Data source
Reference
- Reference Type:
- study report
- Title:
- Unnamed
- Year:
- 2 009
- Report date:
- 2009
Materials and methods
Test guideline
- Qualifier:
- no guideline followed
- Principles of method if other than guideline:
- Analysis was performed by using x‐ray photoelectron spectroscopy (XPS) with a monochromatic Al x‐ray source (150 W) on areas approximately sized 700 x 300 μm. Wide spectra were run to detect elements present in the outermost surface oxide (information depth of a few nanometer) at five different surface area locations. Detailed high resolution spectra (20 eV pass energy) were acquired for the main compositional elements of each test item.
- GLP compliance:
- yes
Test material
- Reference substance name:
- Silicon
- EC Number:
- 231-130-8
- EC Name:
- Silicon
- Cas Number:
- 7440-21-3
- Molecular formula:
- Si
- IUPAC Name:
- silicon
- Details on test material:
- - Name of test material (as cited in study report): polycrystalline silicon (PCS), high grade silicon (HGSi) and low grade silicon (LGSi)
- Analytical purity: PCS: Si 100% (w/w); HGSi: Si 98.7% (w/w); LGSi: Si 98.1% (w/w)
Constituent 1
Results and discussion
- Results:
- Oxidized silicon, both silicon dioxide and silicon sub-oxides, was found to be the main component on the surface. The signal of non-oxidized silicon detected in the analysis of silicon surface was associated with the silicon core right below the very thin (few nanometer thick) oxidized surface layer.
Applicant's summary and conclusion
- Conclusions:
- A thin nanometer thick surface oxide layer primarily composed of silica is present on the surface of silicon.
- Executive summary:
Surface composition analysis of silicon was performed by using x‐ray photoelectron spectroscopy (XPS). Oxidized silicon, both silicon dioxide and silicon sub-oxides, was found to be the main component on the surface. The signal of non-oxidized silicon detected in the analysis of silicon surface was associated with the silicon core right below the very thin (few nanometer thick) oxidized surface layer.
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